Multiphysics approaches for modeling nanostructural evolution during physical vapor deposition of phase-separating alloy films

Physical Vapor Deposition Simulations of Microstructure Evolution

Modeling and Simulation for Physical Vapor Deposition: Multiscale Model

In this paper we present modeling and simulation for physical vapor deposition for metallic bipolar plates. In the models we discuss the application of different models to simulate the transport of chemical reactions of the gas species in the gas chamber. The so called sputter process is an extremely sensitive process to deposit thin layers to metallic plates. We have taken into account lower o...

Preventing kinetic roughening in physical vapor-phase-deposited films.

The growth kinetics of the mostly used physical vapor-phase deposition techniques -molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition-is investigated by rate equations with the aim of testing their suitability for the preparation of ultraflat ultrathin films. The techniques are studied in regard to the roughness and morphology during early stages of growth. We de...

Mathematical Modeling of the Melt Pool During a Physical Vapor Deposition Process

Acknowledgements I would like to dedicate this work to my caring, supportive, and devoted wife, Amy. I would also like to thank my parents and family for their continued encouragement throughout my education. In addition, I would like to thank Professors Uday Pal and Roger Kamm for their time, expertise, and guidance. Abstract Table of Symbols Chapter 1.0

Numerical Modeling of Gas-Phase Nucleation and Particle Growth during Chemical Vapor Deposition of Silicon

A numerical model was developed to predict gas-phase nucleation of particles during silane pyrolysis. The model includes a detailed clustering mechanism for the formation of hydrogenated silicon clusters containing up to ten silicon atoms. This mechanism was coupled to an aerosol dynamics moment model to predict particle growth, coagulation, and transport. Both zero-dimensional transient simula...